User contributions for Sebseb22

11 May 2024

• 18:3318:33, 11 May 2024 diff hist +7,945‎ m Thin film ‎ Added further description of Volmer-Weber growth, and additional description of stress evolution during deposition Tag: Visual edit

8 May 2024

• 03:3803:38, 8 May 2024 diff hist +6,326‎ N User:Sebseb22/sandbox ‎ ←Created page with '{{User sandbox}} <!-- EDIT BELOW THIS LINE -->'''To add in after the “measuring stress and strain” paragraph:'''   A common method for determining the stress evolution of a film is to measure the wafer curvature during its deposition. Stoney [4] relates a film’s average stress to its curvature through the following expression:   <math>\kappa=\frac{6\langle \sigma \rangle h_f}{M_sh^2_s}</math>, where <math>M_s = \frac{\Epsilon}{1-\upsilon}</math>...' current Tag: Visual edit